What Does Noohapou Mean?
What Does Noohapou Mean?
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The POU3500 process features dynamic temperature Charge of the procedure chamber cathode / electrode / anode and will be synchronized with any etch approach.
Device & TCU computer software calibration treatments fluctuate external exam gear not utilised often for verifying
The information beneath is classified by semiconductor process and Device company. Each table incorporates an Applications Matrix that shows qulified and industrial processes.
initially Established in 1985, our enterprise has developed right into a identified chief in offering temperature Regulate systems to the worldwide semiconductor industry.
LAUDA-Noah will, to get a shopper's retrofit analysis, monitor and change its fluid temperature Management profiles to match an present TCUs' if you want to guarantee a clean method integration via DAQ.
The precision of your POU 3300 permits independent control of the procedure fluid temperature towards the wafer chuck within just +/- 0.one °C of set point, along with the quickly response time on the process allows for max wafer-to-wafer repeatability through the etch system.
The precision on the POU 3500 allows for impartial Charge of the procedure fluid temperature to the wafer chuck in +/- 0.1 °C of set position, and the rapid response time with the process permits for max wafer-to-wafer repeatability throughout the etch process.
With our device strategically mounted somewhere around 6 ft from the chamber, we obtain a much more precise studying of your chuck temperature. This solution makes certain dependable temperature throughout the output ton, leading to improved wafer-to-wafer CD uniformity.
significant Footprint: Static units occupy important Room within the fabrication Device location, cutting down its performance.
Dynamic Temperature Manage, as carried out in programs much like the LAUDA-Noah POU, can be an method that senses the temperature of the process fluid getting back from the method chamber’s wafer chuck (ESC) and dynamically adjusts the here temperature from the equipped procedure fluid determined by this true-time opinions.
the info established here is from a 200mm volume production wafer fab and Obviously illustrates the benefit of the LAUDA-Noah POU method.
The POU3300 program gives dynamic temperature Charge of the procedure chamber cathode / electrode / anode and might be synchronized with any etch method.
the truth is always that genuine Dynamic Temperature Regulate can only be accomplished when all 5 (5) of the subsequent system design and style and set up requirements are met:
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